Noise reduction in the recording of holographic masks in photoresist

Lucila H. D. Cescato; Leandro L. Soares; Elso Luiz Rigon; Marco A.R. Alves; Edmundo S. Braga

doi:10.1117/12.360529

31 August 1999 Noise reduction in the recording of holographic masks in photoresist

Lucila H. D. Cescato, Leandro L. Soares, Elso Luiz Rigon, Marco A.R. Alves, Edmundo S. Braga

Proceedings Volume 3879, Micromachine Technology for Diffractive and Holographic Optics; (1999) https://doi.org/10.1117/12.360529
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

The lithography of gratings or structures using photoresist holographic masks is very critical, in particular when high selectivity etching processes were employed. In this paper we study the effect of the mask profile and of the phase perturbations during the holographic exposure in the noise of the photoresist masks. It is shown that the use of appropriate conditions of development and exposure may reduce significantly this noise allowing the recording of high aspect ratio structures and the use of selective deposition techniques.

Citation Download Citation

Lucila H. D. Cescato, Leandro L. Soares, Elso Luiz Rigon, Marco A.R. Alves, and Edmundo S. Braga "Noise reduction in the recording of holographic masks in photoresist", Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); https://doi.org/10.1117/12.360529

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