31 August 1999 Potential of dry etching for the fabrication of fused silica micro-optical elements
Author Affiliations +
Proceedings Volume 3879, Micromachine Technology for Diffractive and Holographic Optics; (1999) https://doi.org/10.1117/12.360533
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
We report on recent progress in the fabrication of fused silica micro-optical elements, such as blazed gratings, refractive microlenses and microprisms. The elements are first made in photoresist and then they are transferred into fused silica by reactive ion etching. High selectivity etching is needed to realize structures with a high aspect ratio. Results are shown using various metallic etch masks. The shaping of optimized profiles is also presented to generate microlenses which are aspheric, or which have a low numerical aperture.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philippe Nussbaum, Philippe Nussbaum, Kenneth J. Weible, Kenneth J. Weible, Markus Rossi, Markus Rossi, Hans Peter Herzig, Hans Peter Herzig, } "Potential of dry etching for the fabrication of fused silica micro-optical elements", Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); doi: 10.1117/12.360533; https://doi.org/10.1117/12.360533
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT


Back to Top