Enabling and cost-effective TiCl4-based PECVD Ti and CVD TiN processes for gigabit DRAM technology

Sri Srinivas; Ming Xi; Brian Metzger; Zvi Lando; Murali K. Narasimhan; Fusen E. Chen

doi:10.1117/12.360581

11 August 1999 Enabling and cost-effective TiCl₄-based PECVD Ti and CVD TiN processes for gigabit DRAM technology

Sri Srinivas, Ming Xi, Brian Metzger, Zvi Lando, Murali K. Narasimhan, Fusen E. Chen

Proceedings Volume 3883, Multilevel Interconnect Technology III; (1999) https://doi.org/10.1117/12.360581
Event: Microelectronic Manufacturing '99, 1999, Santa Clara, CA, United States

Abstract

This paper discusses TiCl₄ based PECVD Ti and CVD TiN processes that enable a critical contact technology for cost effective gradient DRAMs. The PECVD Ti contact silicidation process and the CVD TiN barrier process together allow for reliable contact metallization with excellent contact resistance and leakage current performance for aspect ratios >12:1. Such capability has allowed a substantial increase in capacitor height alleviating the need for either a change in the capacitor dielectric as well as allowing the continuation of the bitline over capacitor metallization architecture. In addition, the in-situ silicidation capability of the PECVD Ti process allows for the elimination of the contact silicidation anneal step. When used as the top electrode in Ta₂O₃ based capacitor structures, TiCl₄ based CVD TiN provides for reliable metallization with excellent leakage current performance. Preliminary results show that CVD TiN provides the capability for a complete plug fill with no peeling or cracking.

Citation Download Citation

Sri Srinivas, Ming Xi, Brian Metzger, Zvi Lando, Murali K. Narasimhan, and Fusen E. Chen "Enabling and cost-effective TiCl₄-based PECVD Ti and CVD TiN processes for gigabit DRAM technology", Proc. SPIE 3883, Multilevel Interconnect Technology III, (11 August 1999); https://doi.org/10.1117/12.360581

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available