3 April 2000 Fabrication of large-aperture random phase plate for uniform illumination on laser fusion target
Author Affiliations +
Proceedings Volume 3889, Advanced High-Power Lasers; (2000); doi: 10.1117/12.380867
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan
Abstract
We have fabricated a large aperture random phase plate (RPP) in Chinese K9 glass substrate for target-plane laser beam smoothing at 1.06 micrometer wavelength, by using large aperture photolithography and dilute HF etching processes. The RPP's clear aperture is (phi) 250 mm. The measured average step height is 1.060 micrometer, which has a relative standard deviation of 1.24% at 5 locations on the RPP to the theoretical value. A focal spot with very sharp edges and nearly flat-top overall envelope intensity distribution is obtained at the focal-plane of a focusing lens. These results show that our fabrication techniques for RPP is effective, and is easily scaleable to even larger apertures.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Huijie Huang, Dunwu Lu, Runwen Wang, Yongkai Zhao, Zengshui Liu, "Fabrication of large-aperture random phase plate for uniform illumination on laser fusion target", Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); doi: 10.1117/12.380867; https://doi.org/10.1117/12.380867
PROCEEDINGS
6 PAGES


SHARE
KEYWORDS
Fabrication

Photomasks

Glasses

Laser welding

Photoresist materials

Ultraviolet radiation

Chemical elements

Back to Top