3 April 2000 Modeling of a pulsed HF chemical laser pumped by a VUV radiation source
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Proceedings Volume 3889, Advanced High-Power Lasers; (2000) https://doi.org/10.1117/12.380855
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan
Abstract
We introduce a numerical investigation of a HF photochemical laser pumped by planar multi-channel sliding discharge to study the possibility of advanced laser characteristic achievement using such pumping source. The model considers transport of VUV pump radiation through the nonlinear absorptive active medium containing NF3/H2/N2Ar gas mixture coupled with chemical and lasing kinetics describing the temporal and spatial evolution of particle species and intracavity lasing photons. The relative importance of various kinetic processes is evaluated and the 3.2 J/liter laser specific energy is calculated.
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Marc P. Sabonnadiere, Marc P. Sabonnadiere, Vadim I. Tcheremiskine, Vadim I. Tcheremiskine, Philippe Ch. Delaporte, Philippe Ch. Delaporte, L. D. Mikheev, L. D. Mikheev, Marc L. Sentis, Marc L. Sentis, } "Modeling of a pulsed HF chemical laser pumped by a VUV radiation source", Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); doi: 10.1117/12.380855; https://doi.org/10.1117/12.380855
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