Translator Disclaimer
Paper
3 April 2000 Nanosecond high-energy oscillator: regenerative amplifier excimer laser system
Author Affiliations +
Proceedings Volume 3889, Advanced High-Power Lasers; (2000) https://doi.org/10.1117/12.380906
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan
Abstract
Energetic nanosecond UV sources could be advantageously used in laser material processing, biomedicine and to create laser- produced plasmas emitting soft X-ray radiation. SOPRA, in collaboration with IRPHE, is then developing an oscillator- regenerative amplifier XeCl laser system of short duration (1 - 3 ns), high energy and moderate divergence. Insertion in the amplification loop of the seed pulse and final extraction of the amplified laser pulse are realized by controlling the evolution of its polarization state by means of a HT driven Pockels cell and a half-wave plate. The experimental results are discussed and compared to numerical ones issued from a code describing the amplification of the seed pulse in the active medium. Finally, it is shown that the maximum output peak power is fairly low, PL approximately 1.4 MW (EL approximately 4.8 mJ, (tau) FWHM approximately equals 3.4 ns), due to important energetic loss as the highly divergent amplified beam is truncated by low-diameter aperture.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olivier P. Uteza, Nathalie Destouches, Philippe Ch. Delaporte, Bernard L. Fontaine, and Marc L. Sentis "Nanosecond high-energy oscillator: regenerative amplifier excimer laser system", Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); https://doi.org/10.1117/12.380906
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top