1 October 1999 Diffusion mechanisms in microlithographic thin polymeric films
Author Affiliations +
The contribution proposes relationships for the diffusivity of small molecular species in resist systems; then reviews the possible mechanisms in thin polymeric films, namely simple Fickian, Case II, and diffusion accompanied by chemical reaction, with relevance to microlithography processes. The review of the kinetics reveals the inconsistencies in the models advanced for two important microlithographic processes: (i) silylation in Surface Imaging patterning; and (ii) the deactivation of the Chemical Amplification resist due to the parasitic diffusion of N-methyl-pyrolid-one. These inconsistencies can be easily and elegantly resolved only if the polymeric thin film system is supposed to exhibit a kinetics consistent with the diffusion accompanied by chemical reaction.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan V. Nicolau, Dan V. Nicolau, Takahisa Taguchi, Takahisa Taguchi, Susumu Yoshikawa, Susumu Yoshikawa, } "Diffusion mechanisms in microlithographic thin polymeric films", Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364491; https://doi.org/10.1117/12.364491

Back to Top