Usage of polarization for high-accuracy micrometrology sensors

Michael Totzeck; Harald Jacobsen; Hans J. Tiziani

doi:10.1117/12.369336

11 November 1999 Usage of polarization for high-accuracy micrometrology sensors

Michael Totzeck, Harald Jacobsen, Hans J. Tiziani

Proceedings Volume 3897, Advanced Photonic Sensors and Applications; (1999) https://doi.org/10.1117/12.369336
Event: International Symposium on Photonics and Applications, 1999, Singapore, Singapore

Abstract

The general idea of the presented investigations is to use the polarization of the electromagnetic field in high- resolution optical microscopy to get information about sub- wavelength details of topographical structures. The main application is the localization of vertical edges. For structures in non-magnetic materials, polarization effects are caused by the different boundary conditions for the tangential and normal electric field components. Using rigorous numerical simulations we show that two physical- optics model describe the polarization dependent images of vertical edges and sub-wavelength structures: a boundary diffraction wave originating from the tip of the edge and waveguiding effects, respectively. We report on two experimental approach for polarization usage: a) comparison of interference microscopy images for s- and p-polarization, and b) polarization interferometry. The former is capable of 'synthetical microscopy'. Measurements of well defined structures are compared with rigorous numerical simulations.

Citation Download Citation

Michael Totzeck, Harald Jacobsen, and Hans J. Tiziani "Usage of polarization for high-accuracy micrometrology sensors", Proc. SPIE 3897, Advanced Photonic Sensors and Applications, (11 November 1999); https://doi.org/10.1117/12.369336

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