Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers

Winfried Arens; Detlev Ristau; Jens Ullmann; Christoph Zaczek; Roland Thielsch; Norbert Kaiser; Angela Duparre; Oliver Apel; Klaus R. Mann; Hans Lauth; Helmut Bernitzki; Johanes Ebert; Stefan Schippel; H. Heyer

doi:10.1117/12.379314

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3 March 2000 Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers

Winfried Arens; Detlev Ristau; Jens Ullmann; Christoph Zaczek; Roland Thielsch; Norbert Kaiser; Angela Duparre; Oliver Apel; Klaus R. Mann; Hans Lauth; Helmut Bernitzki; Johanes Ebert; Stefan Schippel; H. Heyer

Author Affiliations +

Winfried Arens,¹ Detlev Ristau,¹ Jens Ullmann,² Christoph Zaczek,² Roland Thielsch,³ Norbert Kaiser,³ Angela Duparre,³ Oliver Apel,⁴ Klaus R. Mann,⁴ Hans Lauth,⁵ Helmut Bernitzki,⁵ Johanes Ebert,⁶ Stefan Schippel,⁷ H. Heyer⁷
¹Laser Zentrum Hannover e.V. (Germany)
²Carl Zeiss (Germany)
³Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
⁴Laser-Lab. Goettingen e.V. (Germany)
⁵JENOPTIK Laser, Optik, Systeme (Germany)
⁶Laseroptik GmbH (Germany)
⁷Layertec GmbH (Germany)

Proceedings Volume 3902, Laser-Induced Damage in Optical Materials: 1999; (2000) https://doi.org/10.1117/12.379314
Event: Laser-Induced Damage in Optical Materials: 1999, 1999, Boulder, CO, United States

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Abstract

The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV- excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project 'OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF₃/MgF₂ were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up tot eh mid RI range. calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.

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Winfried Arens, Detlev Ristau, Jens Ullmann, Christoph Zaczek, Roland Thielsch, Norbert Kaiser, Angela Duparre, Oliver Apel, Klaus R. Mann, Hans Lauth, Helmut Bernitzki, Johanes Ebert, Stefan Schippel, and H. Heyer "Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers", Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); https://doi.org/10.1117/12.379314

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KEYWORDS

Absorption

Scattering

Deep ultraviolet

Optical coatings

Optical components

Laser damage threshold

Laser optics

Reflection

Reflectivity

Thin film coatings

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Winfried Arens, Detlev Ristau, Jens Ullmann, Christoph Zaczek, Roland Thielsch, Norbert Kaiser, Angela Duparre, Oliver Apel, Klaus R. Mann, Hans Lauth, Helmut Bernitzki, Johanes Ebert, Stefan Schippel, H. Heyer, "Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers," Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000);

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