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3 March 2000 Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers
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Abstract
The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV- excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project 'OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up tot eh mid RI range. calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Winfried Arens, Detlev Ristau, Jens Ullmann, Christoph Zaczek, Roland Thielsch, Norbert Kaiser, Angela Duparre, Oliver Apel, Klaus R. Mann, Hans Lauth, Helmut Bernitzki, Johanes Ebert, Stefan Schippel, and H. Heyer "Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers", Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); https://doi.org/10.1117/12.379314
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