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7 November 1983 Electron Beam Systems At IBM Status Report
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Abstract
For over ten years IBM has been pursuing Manufacturing Electron Beam Systems in Manufacturing for direct wafer lithography exposure. These efforts have resulted in three generations of systems for wafer exposure, each with a greater capability. These systems have been configured to minimize system ailments and to maximize throughput. Their principal application has been to reduce turn around time. They have provided satisfactory service in Manufacturing and in Development applications. Having proved themselves to be beneficial and reliable Manufacturing tools, electron beams are being implemented for additional applications. Mask exposure, mask inspection and module inspection are some of the newer applications for E-Beam systems, in IBM at East Fishkill.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Edward V. Weber "Electron Beam Systems At IBM Status Report", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); https://doi.org/10.1117/12.935093
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