Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications

David P. Norton; Chan Park; Y. E. Lee; J. D. Budai; M. F. Chisholm; D. T. Verebelyi; D. K. Christen; D. M. Kroeger

doi:10.1117/12.387548

7 June 2000 Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications

David P. Norton, Chan Park, Y. E. Lee, J. D. Budai, M. F. Chisholm, D. T. Verebelyi, D. K. Christen, D. M. Kroeger

Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000) https://doi.org/10.1117/12.387548
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States

Abstract

Over the past decade, pulsed-laser deposition (PLD) has proven to be one of the most versatile and effective methods for obtaining high-quality electronic oxide thin-film materials. Much of this success can be attributed to its initial use in depositing high temperature superconducting materials. However, pulsed-laser deposition is now a leading research tool in the development of various electronic oxide thin-film technologies. In this paper, recent progress in the deposition of oxide materials on dissimilar materials for both superconductor and semiconductor applications is discussed. Recent developments in the synthesis of superconducting wires via epitaxial growth of superconducting oxides on biaxially textured metal tapes is described. In addition, efforts to integrate high-k dielectric oxides on semiconductor surfaces using pulsed- laser deposition are highlighted.

Citation Download Citation

David P. Norton, Chan Park, Y. E. Lee, J. D. Budai, M. F. Chisholm, D. T. Verebelyi, D. K. Christen, and D. M. Kroeger "Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); https://doi.org/10.1117/12.387548

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