7 June 2000 Spectroscopic investigation of SiO2 surfaces of optical materials for high-power lasers
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Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000); doi: 10.1117/12.387569
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States
Abstract
High quality surfaces of fused silica optical materials were studied using microscopic fluorescence imaging as well as Raman and emission micro-spectroscopy. For as-polished surfaces optically active defect formations were detected on the surface of the material which vary in geometry, relative intensity and concentration depending on the polishing process. A partial correlation of these defects with subsequent laser damage sites was indicated. Following laser-induced damage the Raman and photoluminescence spectra indicated extensive materials modification within the damage sites. Emission spectra show at least three characteristic luminescence bands centered at 1.9 eV, 2.2 eV and approximately 4.7 eV. Raman scattering indicates that laser irradiation leads to compaction.
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Stavros G. Demos, Lynn Matthew Sheehan, Mark R. Kozlowski, "Spectroscopic investigation of SiO2 surfaces of optical materials for high-power lasers", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); doi: 10.1117/12.387569; https://doi.org/10.1117/12.387569
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KEYWORDS
Laser induced damage

Luminescence

Silica

Surface finishing

Raman spectroscopy

Polishing

Raman scattering

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