24 March 2000 Ridge waveguide Mach-Zender modulators fabricated by a novel nickel-indiffused LiNbO3 self-aligned process
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Proceedings Volume 3936, Integrated Optics Devices IV; (2000) https://doi.org/10.1117/12.379965
Event: Symposium on Integrated Optoelectronics, 2000, San Jose, CA, United States
Traditionally, there were two fabrication processes for LiNbO3 ridge waveguides, which were nickel (Ni) diffusion prior to PE wet etch, the DE process, and PE wet etch prior to Ni diffusion, the ED process. Though these processes have been optimized and are much better than the dry etch methods, further improvement is necessary. This is because the former easily result in unwanted planar waveguides flanking the ridge structures, while the latter requires relatively complicated process. In this paper, a novel self-aligned fabrication process for Ni:LiNbO3 ridge waveguides has been proposed. By using the self- aligned tri-layered structure composed of Ni/Ti/Si, the fabrication process is significantly simplified. Based on our observations, the deposited thickness of the self- aligned structure will determine the qualities of the ridge waveguides. Moreover, the novel self-aligned fabrication process was applied to fabricate a ridge waveguide Mach- Zehnder modulator. The measured half-wave voltage and extinction ratio were 20.5V and 12dB, and were 4.2V and 8dB.
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Wen-Ching Chang, Wen-Ching Chang, Chao-Yung Sue, Chao-Yung Sue, Hung-Ching Hou, Hung-Ching Hou, Ming-Yung Hsuan, Ming-Yung Hsuan, Li-Ying Chang, Li-Ying Chang, } "Ridge waveguide Mach-Zender modulators fabricated by a novel nickel-indiffused LiNbO3 self-aligned process", Proc. SPIE 3936, Integrated Optics Devices IV, (24 March 2000); doi: 10.1117/12.379965; https://doi.org/10.1117/12.379965


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