Automatic Inspection For In-Aligner Reticle Qualification

H. Liff; R. Brauner; P. Esrig; J. Fee

doi:10.1117/12.935143

7 November 1983 Automatic Inspection For In-Aligner Reticle Qualification

H. Liff, R. Brauner, P. Esrig, J. Fee

Proceedings Volume 0394, Optical Microlithography II: Technology for the 1980s; (1983) https://doi.org/10.1117/12.935143
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

This paper describes work done at Contrex on the development and implementation of an automatic in-aligner reticle qualification system called the WaferVision 2000. This system performs reticle inspection for defects by automatic optical inspection of the photoresist patterns on a wafer printed by the reticle. The inspection is done by automatic comparison of the wafer pattern against a CAD derived design model.

Citation Download Citation

H. Liff, R. Brauner, P. Esrig, and J. Fee "Automatic Inspection For In-Aligner Reticle Qualification", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); https://doi.org/10.1117/12.935143

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