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7 November 1983 Automatic Inspection For In-Aligner Reticle Qualification
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Abstract
This paper describes work done at Contrex on the development and implementation of an automatic in-aligner reticle qualification system called the WaferVision 2000. This system performs reticle inspection for defects by automatic optical inspection of the photoresist patterns on a wafer printed by the reticle. The inspection is done by automatic comparison of the wafer pattern against a CAD derived design model.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Liff, R. Brauner, P. Esrig, and J. Fee "Automatic Inspection For In-Aligner Reticle Qualification", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); https://doi.org/10.1117/12.935143
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