2 May 2000 Micropatterning of photosensitive gel films using the two-ultraviolet-beam interference method
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Proceedings Volume 3943, Sol-Gel Optics V; (2000) https://doi.org/10.1117/12.384358
Event: Symposium on Integrated Optoelectronics, 2000, San Jose, CA, United States
Abstract
Photosensitive gel films were patterned with a two-beam interference method by use of 325-nm-wavelength He-Cd laser. We fabricated 2D periodic structures on photosensitive ZrO2 gel films. The ZrO2 gel films were prepared from Zr(O-n-C4H9)4 chemically modified by benzoyl acetone. For fabrication of 2D pattern, UV-irradiation process was divided into two pats and the substrate was rotated by 90 degrees between the parts. When total irradiation time was equal to the time for grating fabrication, 2D dotted pattern was obtained. A checked pattern was also obtained with irradiation time of 30 min. We also fabricated surface-relief gratings on photosensitive Pb(Zr, Ti)O3 (PZT) gel films. The PZT gel films were formed by dip coating with sol solution, which was prepared from Zr(O-n-C4H9)4 chemically modified with benzoyl acetone, Ti(O-n-C4H9)4 chemically modified with benzoyl acetone, Pb(CH3COO)2, and alcohol. The gel films could be crystallized by annealing at 700 degrees C for 1 hour. The annealed films had a ferro electric phase and a P-E hysteresis loop was obtained. Uniform gratings with a sub-micrometer period were formed on the gel films by two-UV-beams irradiation and etching with butanol. A maximum first-order diffraction efficiency of 28 percent was obtained under a Littrow mounting condition by use of a linear-polarized 633-nm-wavelength light.
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Kenji Kintaka, Kenji Kintaka, Junji Nishii, Junji Nishii, Noboru Tohge, Noboru Tohge, } "Micropatterning of photosensitive gel films using the two-ultraviolet-beam interference method", Proc. SPIE 3943, Sol-Gel Optics V, (2 May 2000); doi: 10.1117/12.384358; https://doi.org/10.1117/12.384358
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