New approach based on simulated annealing for kinoform optimization

Shinya Nozaki; Yen-Wei Chen; Zensho Nakao

doi:10.1117/12.379990

17 March 2000 New approach based on simulated annealing for kinoform optimization

Shinya Nozaki; Yen-Wei Chen; Zensho Nakao

Author Affiliations +

Proceedings Volume 3956, Practical Holography XIV and Holographic Materials VI; (2000) https://doi.org/10.1117/12.379990
Event: Electronic Imaging, 2000, San Jose, CA, United States

Abstract

Several method have been proposed or used to optimize the phase distribution of a kinoform. In this paper, we propose a new approach for optimization of the kinoform based on simulated annealing to reduce the large computation cost.

Citation Download Citation

Shinya Nozaki, Shinya Nozaki, Yen-Wei Chen, Yen-Wei Chen, Zensho Nakao, Zensho Nakao, } "New approach based on simulated annealing for kinoform optimization", Proc. SPIE 3956, Practical Holography XIV and Holographic Materials VI, (17 March 2000); doi: 10.1117/12.379990; https://doi.org/10.1117/12.379990

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