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26 October 1983 Invited Paper Thin Film Technology In Design And Production Of Optical Systems
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Proceedings Volume 0399, Optical System Design, Analysis, and Production; (1983) https://doi.org/10.1117/12.935438
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland
Abstract
Basic optical properties of dielectric thin films for interference applications and of metallic optical coatings are reviewed. Some design considerations of how to use thin films best in optical systems are given, and some aspects of thin film production technology relevant to the optical designer and the optician are addressed. The necessity of proper specifications, inclusive of test methods, is emphasized.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. H. Guenther, R. Menningen, and C A. Burke "Invited Paper Thin Film Technology In Design And Production Of Optical Systems", Proc. SPIE 0399, Optical System Design, Analysis, and Production, (26 October 1983); https://doi.org/10.1117/12.935438
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