21 June 2000 Micro-electro-mechanical bandpass filters for signal processing by standard CMOS process
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This investigation fabricates a laminated-suspension microelectromechanical filter by a fully compatible CMOS process. Experimentally, due to the top metal layer begin used as the etch-resistant mask during the subsequent dry etching. Therefore, this study performs maskless etching with plasma and obtains excellent result including high selectivity and full release of the structure. Additionally, the MEMS filter can be driven by applying low-voltage of around 5 volts and a measured center frequency of around 13.1kHz and a quality factor of around 1871 were obtained for a single-comb resonator operate din air. The filter proposed herein has a monolithic integration capability with the relative electric circuits.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsungwei Huang, Tsungwei Huang, Peizen Chang, Peizen Chang, ChiYuan Lee, ChiYuan Lee, Fuyuan Xiao, Fuyuan Xiao, } "Micro-electro-mechanical bandpass filters for signal processing by standard CMOS process", Proc. SPIE 3990, Smart Structures and Materials 2000: Smart Electronics and MEMS, (21 June 2000); doi: 10.1117/12.388923; https://doi.org/10.1117/12.388923


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