3 February 2000 Advanced CD error detection with CD SEM disposition
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Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377115
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany
Abstract
In this study, we used production reticles and a new programmed defect test mask to characterize the sensitivity and false defect performance of several algorithms (ALM100, ALM200 and ALM300). ALM300's sensitivity spec is 60 nm. The inspection results were transferred to a CD SEM for analysis. SEM measurements were taken to validate the sensitivity of the algorithm and to quantify the calibration accuracy of the review tools of the inspection system.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Darren Taylor, Darren Taylor, Barry Rockwell, Barry Rockwell, Aihua Dong, Aihua Dong, Anthony Vacca, Anthony Vacca, Waiman Ng, Waiman Ng, Geoffrey T. Anderson, Geoffrey T. Anderson, William B. Howard, William B. Howard, } "Advanced CD error detection with CD SEM disposition", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377115; https://doi.org/10.1117/12.377115
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