3 February 2000 Advanced writing strategies for high-end mask making
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Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377107
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany
Abstract
In general the writing strategies of the Leica ZBA 320 tool are presented to the audience. Methods to achieve a high productivity in writing masks of the next generation are highlighted. Thus, such writing modes like variable-shaped beam using 6 shape types, vector scan and `writing-on-the- fly' are explained in their inter-action. Our strategies to constantly improve the accuracy parameters, such like n-pass writing and soft boundaries are not only described but also illustrated by our latest application results. Finally data processing by hierarchical data structures as the main factor to support the above-mentioned writing strategies is outlined in this paper.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Melchior Lemke, Melchior Lemke, Juergen Gramss, Juergen Gramss, Hans-Joachim Doering, Hans-Joachim Doering, Hans Eichhorn, Hans Eichhorn, Gerhard Schubert, Gerhard Schubert, } "Advanced writing strategies for high-end mask making", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377107; https://doi.org/10.1117/12.377107
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