3 February 2000 Defect printability and repair of alternating phase-shift masks
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Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377104
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany
Abstract
This paper will start with an overview of the different defect types which can occur on alternating phase shifting masks. A test mask with programmed defects of these different types was fabricated. The defect printability was investigated using an AIMS system. These results were correlated to first printing results in the wafer-fab. The results give an overview of the requirements for an inspection and repair system for alternating phase shifting masks. In order to get a better understanding of this printability behavior first simulations of defects using a 3D mask simulation tool were carried out and compared to the measurements. Several examples of quartz-repairs with different qualities are presented together with the influence on the aerial image.
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Christoph M. Friedrich, Martin Verbeek, Leonhard Mader, Christian Crell, Rainer Pforr, Uwe A. Griesinger, "Defect printability and repair of alternating phase-shift masks", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377104; https://doi.org/10.1117/12.377104
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