Implementing reticle blank inspection in a production environment

Kevin A. Krause; William B. Howard

doi:10.1117/12.377116

3 February 2000 Implementing reticle blank inspection in a production environment

Kevin A. Krause, William B. Howard

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377116
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

Photronics and KLA-Tencor are jointly examining several aspects of reticle blank inspection. PBS blank quality has been examined using the KLA-Tensor STARlight reticle inspection system. PBS blanks were inspected using a 500-nm pixel with the highest sensitivity settings. Data from the initial phases of this study show conclusively that blank defects with certain characteristics can, with high probability, `transfer' to the finished reticle. These conclusions were drawn from a systematic study of several test samples containing 452 blank defects. These defects were classified using three different characteristics and correlation studies were completed to determine which factors most significantly influence transfer rates. This study has now been expanded to include production reticles. The results are being used to develop a comprehensive blank inspection protocol in a commercial mask production facility. We report on all phases of the project including the trial program.

Citation Download Citation

Kevin A. Krause and William B. Howard "Implementing reticle blank inspection in a production environment", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377116

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