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Printing characteristics of proximity x-ray lithography and comparison with optical lithography for 100-nm node and below
Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts
Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography (EPL)
Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL