Carbon fiber composite photomask stage component

Brian E. Catanzaro; Jack E. Dyer; David Trost

doi:10.1117/12.390103

21 July 2000 Carbon fiber composite photomask stage component

Brian E. Catanzaro, Jack E. Dyer, David Trost

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390103
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The semiconductor industry utilizes complex patterning tools to achieve the patterning of fine features. These tools require stiff, lightweight, dimensionally stable components in order to reliably pattern photomasks and wafers. Traditionally, these tools have used metals, ceramics, and low expansion glasses. However, a new class of materials, high performance composites, has demonstrated promise for replacing these materials. This paper discusses the design, manufacturing, and test of a carbon fiber composite stage component of an electron beam lithography tool.

Citation Download Citation

Brian E. Catanzaro, Jack E. Dyer, and David Trost "Carbon fiber composite photomask stage component", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390103

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available