21 July 2000 Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems
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Abstract
Studies show that Coulomb interactions in the crossover region contribute significantly to the beam blur on the wafer at high beam currents. We increased the crossover size using a pair of compensating lens aberrations. Up to a 20% spot size reduction has been achieved at 20 (mu) A beam current and 1.5 mR convergence angle in simulation. We further compare interbeamlet electron interactions with intra-beamlet electron interactions in the column for different column configurations. Results also show that the stochastic blur due to Coulomb interactions from different beamlets can be combined on a root mean square basis. This result has been used to evaluate and compare the blur contribution from the stochastic interaction and space charge effect.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bo Wu, Andrew R. Neureuther, "Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390110; https://doi.org/10.1117/12.390110
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