21 July 2000 Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems
Author Affiliations +
Abstract
Studies show that Coulomb interactions in the crossover region contribute significantly to the beam blur on the wafer at high beam currents. We increased the crossover size using a pair of compensating lens aberrations. Up to a 20% spot size reduction has been achieved at 20 (mu) A beam current and 1.5 mR convergence angle in simulation. We further compare interbeamlet electron interactions with intra-beamlet electron interactions in the column for different column configurations. Results also show that the stochastic blur due to Coulomb interactions from different beamlets can be combined on a root mean square basis. This result has been used to evaluate and compare the blur contribution from the stochastic interaction and space charge effect.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bo Wu, Bo Wu, Andrew R. Neureuther, Andrew R. Neureuther, } "Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390110; https://doi.org/10.1117/12.390110
PROCEEDINGS
10 PAGES


SHARE
Back to Top