Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama; Hajime Aoyama; Shinji Tsuboi; Hiroshi Watanabe; Yukiko Kikuchi; Mizunori Ezaki; Yasuji Matsui; Tetsuo Morosawa; Kenichi Saito; Shigehisa Ohki; Tadahito Matsuda

doi:10.1117/12.390033

21 July 2000 Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama, Hajime Aoyama, Shinji Tsuboi, Hiroshi Watanabe, Yukiko Kikuchi, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Kenichi Saito, Shigehisa Ohki, Tadahito Matsuda

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390033
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The keys to precision x-ray mask fabrication are the EB mask writer and the process of writing on a thin membrane. This paper concerns the delineation performance for 100 kV EB writing on x-ray membrane mask. We installed and evaluated an advanced EB mask writer, the EB-X3, which features an accelerating voltage of 100 kV and a 5-axes laser interferometer stage employing a laser measurement system with a resolution of 0.6 nm for high resolution and accuracy. The stable 100 kV EB has a good resolution around 50 nm and a beam address of 1 nm, which provide a repeatability of mark detection within 4 nm. As a result, an absolute image placement accuracy within 15 nm was obtained for 1G-bit level ULSI patterns. In addition, the combination of 100 kV EB and membrane process was found to reduce proximity effects. By several improvements including higher-order height correction and membrane process refinement, the final target of an absolute image placement error within 10 nm and a CD accuracy within 8 nm should be achieved in FY2000.

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Yoshinori Nakayama, Hajime Aoyama, Shinji Tsuboi, Hiroshi Watanabe, Yukiko Kikuchi, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Kenichi Saito, Shigehisa Ohki, and Tadahito Matsuda "Delineation performances of advanced 100-kV EB writer on x-ray membrane mask", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390033

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