Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama; Hajime Aoyama; Shinji Tsuboi; Hiroshi Watanabe; Yukiko Kikuchi; Mizunori Ezaki; Yasuji Matsui; Tetsuo Morosawa; Kenichi Saito; Shigehisa Ohki; Tadahito Matsuda

doi:10.1117/12.390033

21 July 2000 Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama; Hajime Aoyama; Shinji Tsuboi; Hiroshi Watanabe; Yukiko Kikuchi; Mizunori Ezaki; Yasuji Matsui; Tetsuo Morosawa; Kenichi Saito; Shigehisa Ohki; Tadahito Matsuda

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390033
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The keys to precision x-ray mask fabrication are the EB mask writer and the process of writing on a thin membrane. This paper concerns the delineation performance for 100 kV EB writing on x-ray membrane mask. We installed and evaluated an advanced EB mask writer, the EB-X3, which features an accelerating voltage of 100 kV and a 5-axes laser interferometer stage employing a laser measurement system with a resolution of 0.6 nm for high resolution and accuracy. The stable 100 kV EB has a good resolution around 50 nm and a beam address of 1 nm, which provide a repeatability of mark detection within 4 nm. As a result, an absolute image placement accuracy within 15 nm was obtained for 1G-bit level ULSI patterns. In addition, the combination of 100 kV EB and membrane process was found to reduce proximity effects. By several improvements including higher-order height correction and membrane process refinement, the final target of an absolute image placement error within 10 nm and a CD accuracy within 8 nm should be achieved in FY2000.

Citation Download Citation

Yoshinori Nakayama, Yoshinori Nakayama, Hajime Aoyama, Hajime Aoyama, Shinji Tsuboi, Shinji Tsuboi, Hiroshi Watanabe, Hiroshi Watanabe, Yukiko Kikuchi, Yukiko Kikuchi, Mizunori Ezaki, Mizunori Ezaki, Yasuji Matsui, Yasuji Matsui, Tetsuo Morosawa, Tetsuo Morosawa, Kenichi Saito, Kenichi Saito, Shigehisa Ohki, Shigehisa Ohki, Tadahito Matsuda, Tadahito Matsuda, } "Delineation performances of advanced 100-kV EB writer on x-ray membrane mask", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390033; https://doi.org/10.1117/12.390033

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years