Development of an electric capillary discharge source

Neal R. Fornaciari; Jim J. Chang; Daniel R. Folk; Steven E. Gianoulakis; John E. M. Goldsmith; Glenn D. Kubiak; Bruce C. Long; Donna J. O'Connell; Gregory M. Shimkaveg; William T. Silfvast; Kenneth D. Stewart

doi:10.1117/12.390047

21 July 2000 Development of an electric capillary discharge source

Neal R. Fornaciari, Jim J. Chang, Daniel R. Folk, Steven E. Gianoulakis, John E. M. Goldsmith, Glenn D. Kubiak, Bruce C. Long, Donna J. O'Connell, Gregory M. Shimkaveg, William T. Silfvast, Kenneth D. Stewart

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390047
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We report on the development of an electric capillary discharge source that radiates with comparable efficiency at both 13.5 nm and 11.4 nm, two wavelengths of interest for EUV lithography. The discharge source is comprised of a low- pressure, xenon-filled, small diameter capillary tube with electrodes attached to both ends. A high-voltage electric pulse applied across the capillary tube generates an intense plasma that radiates in the EUV. This source is capable of producing 7 mJ/steradian per pulse in a 0.3 nm bandwidth centered at 13.4 nm. In this paper we will address three significant issues related to the successful development of this source: minimization of debris generation, thermal management, and imaging quality.

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Neal R. Fornaciari, Jim J. Chang, Daniel R. Folk, Steven E. Gianoulakis, John E. M. Goldsmith, Glenn D. Kubiak, Bruce C. Long, Donna J. O'Connell, Gregory M. Shimkaveg, William T. Silfvast, and Kenneth D. Stewart "Development of an electric capillary discharge source", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390047

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