21 July 2000 Development of an electric capillary discharge source
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Abstract
We report on the development of an electric capillary discharge source that radiates with comparable efficiency at both 13.5 nm and 11.4 nm, two wavelengths of interest for EUV lithography. The discharge source is comprised of a low- pressure, xenon-filled, small diameter capillary tube with electrodes attached to both ends. A high-voltage electric pulse applied across the capillary tube generates an intense plasma that radiates in the EUV. This source is capable of producing 7 mJ/steradian per pulse in a 0.3 nm bandwidth centered at 13.4 nm. In this paper we will address three significant issues related to the successful development of this source: minimization of debris generation, thermal management, and imaging quality.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Neal R. Fornaciari, Neal R. Fornaciari, Jim J. Chang, Jim J. Chang, Daniel R. Folk, Daniel R. Folk, Steven E. Gianoulakis, Steven E. Gianoulakis, John E. M. Goldsmith, John E. M. Goldsmith, Glenn D. Kubiak, Glenn D. Kubiak, Bruce C. Long, Bruce C. Long, Donna J. O'Connell, Donna J. O'Connell, Gregory M. Shimkaveg, Gregory M. Shimkaveg, William T. Silfvast, William T. Silfvast, Kenneth D. Stewart, Kenneth D. Stewart, } "Development of an electric capillary discharge source", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390047; https://doi.org/10.1117/12.390047
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