EUV interferometry of a four-mirror ring-field EUV optical system

Kenneth A. Goldberg; Patrick P. Naulleau; Phillip J. Batson; Paul Denham; Erik H. Anderson; Jeffrey Bokor; Henry N. Chapman

doi:10.1117/12.390045

21 July 2000 EUV interferometry of a four-mirror ring-field EUV optical system

Kenneth A. Goldberg, Patrick P. Naulleau, Phillip J. Batson, Paul Denham, Erik H. Anderson, Jeffrey Bokor, Henry N. Chapman

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390045
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

At-wavelength, extreme ultraviolet interferometric measurements of a new, four-mirror, ring-field projection optical system have been made. Designed for operation at 13.4- nm wavelength with a 0.1 numerical aperture and a 26 mm field of view at the wafer, the nearly diffraction-limited wavefront quality of the system has been verified interferometrically. After assembly and alignment with visible-light interferometry, the optic was transported to Lawrence Berkeley National Laboratory where the at-wavelength testing with a phase-shifting point diffraction interferometer was performed. Measurement of the system wavefront at a number of points across the field of view reveals the optical performance of the system over its large, ring-field imaging area.

Citation Download Citation

Kenneth A. Goldberg, Patrick P. Naulleau, Phillip J. Batson, Paul Denham, Erik H. Anderson, Jeffrey Bokor, and Henry N. Chapman "EUV interferometry of a four-mirror ring-field EUV optical system", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390045

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