2 June 2000 Importance of measurement accuracy in statistical process control
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Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000); doi: 10.1117/12.386462
Event: Microlithography 2000, 2000, Santa Clara, CA, United States
Abstract
Precision is deemed the most important aspect of a measurement for process control. This paper discusses the role of accuracy in process control and product quality. Although the discussion is emphasized for CD SEM metrology systems, the idea can be extended to other metrology areas such as thickness measurement where in addition to thickness, material characteristics also play a role. In 1999, the characteristics of accuracy were published in a landmark paper. The authors introduced the concept of characteristic slope and offset for the purpose of tool evaluation. Slope and offset were obtained from correlation plots of a measurement tool under test with a reference measurement system. The measurands were features that represent the range of process variations in a line. This paper builds on the ideas put forth in that reference and discusses the impact of measurement accuracy on process control. First, the issue is considered in an abstract sense, by comparison of the measurement method under test to a standard reference method. Then practical implications are discussed in more detail when tools from different suppliers are used in a fab to manufacture products.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Farid Askary, Neal T. Sullivan, "Importance of measurement accuracy in statistical process control", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386462; https://doi.org/10.1117/12.386462
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KEYWORDS
Scanning electron microscopy

Process control

Critical dimension metrology

Calibration

Manufacturing

Metrology

Photomasks

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