Process-induced defects in sub-0.15-nm device patterning using 193-nm lithography

Uzodinma Okoroanyanwu; Christopher Pike; Harry J. Levinson

doi:10.1117/12.386482

2 June 2000 Process-induced defects in sub-0.15-nm device patterning using 193-nm lithography

Uzodinma Okoroanyanwu, Christopher Pike, Harry J. Levinson

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386482
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Process induced defects in sub-0.15 micrometer devices patterned on 193-nm photoresists have been studied and related to the physical and rheological properties of these polymers, as well as to the interaction of the photoresists with the two principal track-related unit operations: spin-coating and development. Studies on unpatterned wafers with these photoresists were conducted to elucidate the dependence of defectivity and defect types on spin coating parameters. Imaging was done on a full-field ASML 193 nm scanner and the resist processing was performed on a TEL MARK-8 track. Defect inspection was performed with a KLA 2132, KLA SP1 bright field inspection systems, and defect review was carried out with JEOL 7515 SEM tool. Results indicate that defectivity of an optimized 193-nm resist process is comparable to a well- optimized 248-nm baseline resist process. It was found that 193-nm resists suffer from the same residue problems as those of 248-nm. Yield data obtained on 193-nm and 248-nm resists processed under optimized conditions demonstrate that the 193- nm resist process is capable performance comparable to that of a baseline 248-nm resist process.

Citation Download Citation

Uzodinma Okoroanyanwu, Christopher Pike, and Harry J. Levinson "Process-induced defects in sub-0.15-nm device patterning using 193-nm lithography", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386482

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available