2 June 2000 Ultraprecision focus technique
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Abstract
A novel method of measuring absolute position using broad band laser interferometry is presented. The interferometer has been designed and implemented as the metric for a real-time stage focus micro-lithography application. Highlights of the metric are high precision (less than 100 nm) and wide range (300 microns).
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Vivek Garg, Boris B. Grek, "Ultraprecision focus technique", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386538; https://doi.org/10.1117/12.386538
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