2 June 2000 Ultraprecision focus technique
Author Affiliations +
A novel method of measuring absolute position using broad band laser interferometry is presented. The interferometer has been designed and implemented as the metric for a real-time stage focus micro-lithography application. Highlights of the metric are high precision (less than 100 nm) and wide range (300 microns).
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vivek Garg, Boris B. Grek, "Ultraprecision focus technique", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386538; https://doi.org/10.1117/12.386538

Back to Top