PROCEEDINGS VOLUME 3999
MICROLITHOGRAPHY 2000 | 27 FEBRUARY - 3 MARCH 2000
Advances in Resist Technology and Processing XVII
Editor(s): Francis M. Houlihan
MICROLITHOGRAPHY 2000
27 February - 3 March 2000
Santa Clara, CA, United States
ArF: Materials
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 2 (23 June 2000); doi: 10.1117/12.388254
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 13 (23 June 2000); doi: 10.1117/12.388303
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ArF: Materials and Processing
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ArF: Fundamental Studies
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Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 136 (23 June 2000); doi: 10.1117/12.388284
ArF, KrF: Fundamental PAG Studies
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 148 (23 June 2000); doi: 10.1117/12.388294
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 161 (23 June 2000); doi: 10.1117/12.388299
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ArF, KrF: Fundamental Studies
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 190 (23 June 2000); doi: 10.1117/12.388302
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ArF, KrF: LER Studies
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Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 270 (23 June 2000); doi: 10.1117/12.388311
Poster Session
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 699 (23 June 2000); doi: 10.1117/12.388312
KrF: Processing, Etching, and New Materials
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 294 (23 June 2000); doi: 10.1117/12.388313
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 305 (23 June 2000); doi: 10.1117/12.388315
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 322 (23 June 2000); doi: 10.1117/12.388316
VUV: Materials and Fundamental Studies
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 335 (23 June 2000); doi: 10.1117/12.388317
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EUV, X Ray, VUV: Materials and Fundamental Studies
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Poster Session
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KrF: Processing, Etching, and New Materials
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 313 (23 June 2000); doi: 10.1117/12.388293
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 284 (23 June 2000); doi: 10.1117/12.388295
Poster Session
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, pg 464 (23 June 2000); doi: 10.1117/12.388296