23 June 2000 Advanced materials for 193-nm resists
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Abstract
Acrylate monomers containing alicyclic side chains featuring a series of polar substituent groups were assumed to be model compounds. Solubility parameters were calculated for the corresponding acrylate polymers. These acrylate monomers were synthesized using a novel aerobic oxidation reaction employing N-hydroxyphtalimide (NHPI) as a catalyst, and then polymerized. These reactions were confirmed to be applicable for the mass-production of those compounds. The calculation results agreed with the hydrophilic parameters measured experimentally. Moreover, the relationship between the resist performance and the above-mentioned solubility parameter has been studied. As a result, a correlation between the resist performance and the calculated solubility parameter was observed. Finally, resolution of 0.13-micron patterns, based on the 1G DRAM design rule, could be successfully fabricated by optimizing the solubility parameter and the resist composition.
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Tohru Ushirogouchi, Koji Asakawa, Naomi Shida, Takeshi Okino, Satoshi Saito, Yoshinori Funaki, Akira Takaragi, Kentaro Tsutsumi, Tatsuya Nakano, "Advanced materials for 193-nm resists", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388279; https://doi.org/10.1117/12.388279
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