23 June 2000 Comparison of acrylate and methacrylate resin system in ArF lithography
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Abstract
Using 2MAdMA(2-Metyl-2-Adamantylmethacrylate), 2MAdAA(2-Metyl- 2-Adamantylacrylate), GBLMA((gamma) -butyrolactone methacrylate), GBLAA((gamma) -butyrolactone acrylate) monomers, 4 types of copolymers, 2MAdMA/GBLMA, 2MAdMA/GBLAA, 2MAdAA/GBLMA, 2MAdAA/GBLAA resins were prepared. The same PAG formulation was applied to these resins to make ArF resist samples. Resolution capability, dry-etching resistance were evaluated. From the result, it can be concluded that 2MAdAA/GBLMA resin system has the best balance in dry etching resistance, resolution and sensitivity.
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Yasunori Uetani, Yasunori Uetani, Hiroaki Fujishima, Hiroaki Fujishima, } "Comparison of acrylate and methacrylate resin system in ArF lithography", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388260; https://doi.org/10.1117/12.388260
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