23 June 2000 High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride
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Abstract
Tetracyclododecene (TCD) was employed as a key alicyclic structure because TCD-based resist system with high carbon content would show better lithographic performance and better etch resistance than norbornene-based ones. Since hydrophilicity is inherently required in the TCD-based system for good developability, several TCDs functionalized with hydroxyl group were synthesized by Diels-Alder reaction. Calculation by the group contribution methods was carried out in order to estimate the hydrophilicity of the TCDs. Several functionalized TCD-alt-maleic anhydride (MAH) alternating polymers were prepared by free radical polymerization and the alkaline solubility of those polymers were determined using DRM. An optimized resist showed good lithographic performances when a conventional illumination (0.63 NA, (sigma) equals 0.65) is used with a binary mask. The resist could print 110 nm and 100 nm lines on SiON with good proximity bias and large focus latitude. The resist also exhibited better etch resistance than norbornene-based resist system under various etch conditions.
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Katsuji Douki, Katsuji Douki, Toru Kajita, Toru Kajita, Tsutomu Shimokawa, Tsutomu Shimokawa, } "High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388277; https://doi.org/10.1117/12.388277
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