23 June 2000 High-performance EB chemically amplified resists using alicyclic protective groups
Author Affiliations +
The impact of alicyclic protective groups on acid-labile substituents in a vinylphenol-methacrylate-based chemically amplified positive resist was investigated. The resist consists of the copolymer of vinylphenol and adamantyl methacrylate (VP/AdMA) with triflate onium salt as a photo- acid generator. The alicyclic protective groups in our system show a higher reactivity and higher hydrophobicity than those of the tert-butyl group, which is widely used in chemically amplified resists. The resists containing the alicyclic protective group resolved 0.09-micrometer hole patterns at 6 (mu) C/cm2, and a resist with a base additive resolved 0.12-micrometer line and space patterns at 9.0 (mu) C/cm2 using a 50-keV EB lithography system with a 2.38% TMAH aqueous solution as the developer. The dry etching durability of resists containing the alicyclic group was also compared with resists containing the tert-butyl group and with polyvinylphenol (PVP). The dry etching durability of our resists for a C4F8 plasma was 1.3 times superior to that of resist containing the tert-butyl group, and 1.1 times better than that of PVP. This means the thickness of film in pattern fabrication can be reduced to obtain a higher sensitivity and higher resolution.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun-Ichi Kon, Jun-Ichi Kon, Koji Nozaki, Koji Nozaki, Takahisa Namiki, Takahisa Namiki, Ei Yano, Ei Yano, } "High-performance EB chemically amplified resists using alicyclic protective groups", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388288; https://doi.org/10.1117/12.388288

Back to Top