Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation

Seiji Nagahara; Yusuke Sakurai; Masanori Wakita; Yukio Yamamoto; Seiichi Tagawa; Masanori Komuro; Ei Yano; Shinji Okazaki

doi:10.1117/12.388322

23 June 2000 Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation

Seiji Nagahara, Yusuke Sakurai, Masanori Wakita, Yukio Yamamoto, Seiichi Tagawa, Masanori Komuro, Ei Yano, Shinji Okazaki

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388322
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The approach toward the enhancement of the resist sensitivity was investigated by introducing the radical chain reactions into the acid generation processes. The acid yields of various ionic and nonionic acid generators in some solvents and films were examined to search the most efficient system of the radical chain acid proliferation reactions. The acid proliferation was discussed using Gibbs free energy change of the electron transfer reactions in the chain reactions. The most efficient system to realize the chain reactions was the combination of iodonium salt acid generator and secondary alcohol acid amplifiers. In acrylic polymer resists containing the iodonium salt and the alcohol compounds, resist sensitivity was enhanced in electron beam lithography.

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Seiji Nagahara, Yusuke Sakurai, Masanori Wakita, Yukio Yamamoto, Seiichi Tagawa, Masanori Komuro, Ei Yano, and Shinji Okazaki "Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388322

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