Real-time analysis of volatiles formed during processing of a chemically amplified resist

Frances A. Houle; G. Michelle Poliskie; William D. Hinsberg; Dean Pearson; Martha I. Sanchez; Hiroshi Ito; John A. Hoffnagle

doi:10.1117/12.388301

23 June 2000 Real-time analysis of volatiles formed during processing of a chemically amplified resist

Frances A. Houle, G. Michelle Poliskie, William D. Hinsberg, Dean Pearson, Martha I. Sanchez, Hiroshi Ito, John A. Hoffnagle

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388301
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The analysis of vapors desorbing from resist films during processing provides important information on impurity content, loss of resist components, and available decomposition pathways that complements data obtained by film composition studies. We have constructed an instrument for in-situ sampling and identification of volatiles from both bulk polymers and cast films by tandem mass spectrometry. We have used this instrument to identify volatile products from thermal and acid catalyzed deprotection of p-(t- butyloxycarbonyloxy)styrene (PTBOCST) to form p-hydroxystyrene (PHOST). The results show that the two reaction pathways have markedly different chemistry, and that the generally accepted deprotection mechanism oversimplifies what is actually happening in the film.

Citation Download Citation

Frances A. Houle, G. Michelle Poliskie, William D. Hinsberg, Dean Pearson, Martha I. Sanchez, Hiroshi Ito, and John A. Hoffnagle "Real-time analysis of volatiles formed during processing of a chemically amplified resist", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388301

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