Semiempirical calculations for the optimization of microlithographic materials and processes

Dan V. Nicolau

doi:10.1117/12.388258

23 June 2000 Semiempirical calculations for the optimization of microlithographic materials and processes

Dan V. Nicolau

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388258
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The methods derived from computational chemistry in both its two embodiments, i.e. quantum mechanics and molecular mechanics, have been sporadically used for the understanding the photochemical processes and materials-related properties. The usage of computational chemistry was hampered by the available computer power and -- to a lesser extent -- by availability of algorithms and methods. Presently, computational chemistry is a maturer field, with applications in materials science abundant. This contribution presents an example where semiempirical quantum mechanics methods has been used to estimate the molecular absorbance of a photolysis induced intermediate chemical species.

Citation Download Citation

Dan V. Nicolau "Semiempirical calculations for the optimization of microlithographic materials and processes", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388258

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