23 June 2000 Tailored novolak resins for advanced photoresists by a two-step procedure: new insight into the molecular structure is achieved by coupling GPC and MALDI-TOF-MS
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Abstract
Synthesis and structure of novolaks continue to be investigated due to their significant influence on the performance of photoresists. Previously a two-step procedure was reported which enables the manufacturer to vary the monomer composition and order in novolak molecules in a wide range which then allows for the tailoring of the resin properties. Recent reinvestigation of the molecular structure of these novolaks applying gel permeation chromatography and matrix-assisted laser desorption/ionization time-of-flight mass spectrometry has given very interesting new insight into the molecular structure of the two-step synthesis novolaks. Coupling of the two analytical methods provides a new powerful tool to get detailed information on the molecular architecture which cannot be deduced by other methods. Three species of novolak chains have been found. This analytical approach can generally be applied to explore the structure of novolaks made of monomers differing in their molar masses. Using the two- step novolaks high resolution positive and negative tone photoresists for MEMS applications and lift-off processes, respectively, with high alkaline and etch resistance can be produced.
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Freimut Reuther, Ralph-Peter Krueger, Guenter Schulz, Guenther Baehr, Ulrich Westerwelle, Gabi Gruetzner, "Tailored novolak resins for advanced photoresists by a two-step procedure: new insight into the molecular structure is achieved by coupling GPC and MALDI-TOF-MS", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388296; https://doi.org/10.1117/12.388296
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