Visit My Account to manage your email alerts.
Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application
OPC methodology and implementation to prototyping of small SRAM cells of 0.18-μm node logic gate levels
Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication
0.3-μm pitch random interconnect patterning with node connection phase-shifting mask: experiments and simulations
Behavior of fused silica materials for microlithography irradiated at 193 nm with low-fluence ArF radiation for tens of billions of pulses