193-nm step-and-scan lithography equipment

Naoto Sano; Kazuhiro Takahashi; Hitoshi Nakano; Akiyoshi Suzuki

doi:10.1117/12.389041

5 July 2000 193-nm step-and-scan lithography equipment

Naoto Sano, Kazuhiro Takahashi, Hitoshi Nakano, Akiyoshi Suzuki

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389041
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

As the 130 nm era is approaching, requirements for lithography are becoming more and more rigorous. We have developed a 193nm scanner for below 130nm geometries capable of handling either 200 mm or 300 mm wafers. This paper describes the lithography tool performance required for printing 130nm features, focusing on a new 193nm excimer laser exposure tool developed for that age.

Citation Download Citation

Naoto Sano, Kazuhiro Takahashi, Hitoshi Nakano, and Akiyoshi Suzuki "193-nm step-and-scan lithography equipment", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389041

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