5 July 2000 193-nm step-and-scan lithography equipment
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Abstract
As the 130 nm era is approaching, requirements for lithography are becoming more and more rigorous. We have developed a 193nm scanner for below 130nm geometries capable of handling either 200 mm or 300 mm wafers. This paper describes the lithography tool performance required for printing 130nm features, focusing on a new 193nm excimer laser exposure tool developed for that age.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Naoto Sano, Kazuhiro Takahashi, Hitoshi Nakano, Akiyoshi Suzuki, "193-nm step-and-scan lithography equipment", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389041; https://doi.org/10.1117/12.389041
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