5 July 2000 Aberrations of steppers using phase-shifting point diffraction interferometry
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Abstract
There exists no method to study aberrations of stepper system with in-situ interferometry. Such a method would help a lithographer understand a system's limitations. We propose using phase shifting point diffraction interferometry to do this. The paper discusses a prototype experiment done on a 436 nm optic.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Parthasarathy Venkataraman, Parthasarathy Venkataraman, Bruce W. Smith, Bruce W. Smith, } "Aberrations of steppers using phase-shifting point diffraction interferometry", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388962; https://doi.org/10.1117/12.388962
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