5 July 2000 Continuous Image Writer: a new approach to fast direct writing
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Abstract
We report on the development of a production tool of a new system for fast submicron lithography by optical direct wring. The Continuous Image Writer (CIW) combines the advantages of direct writing by using a programmable mask with the advantages of conventional optical lithography by using the same lithographic processes for image formation in photoresists. The CIW can write faster than conventional direct writers and it is more flexible than wafer steppers or scanners. The CIW is designed for maskless patterning of wafers and substrates down to 0.60 micrometers feature size. It reaches a maximum writing speed of 1,250 mm2/min. Our system uses a Lambda Physik KrF excimer laser as light source. The CIW includes all the components necessary for the fully automated exposure of wafers or substrates including automated substrate handling and alignment.
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Joerg Paufler, Stefan Brunn, Joachim Bolle, Tim Koerner, Aenne Baudach, Reiner Lindner, "Continuous Image Writer: a new approach to fast direct writing", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389081; https://doi.org/10.1117/12.389081
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