Effect of lens aberrations on pattern placement error

Richard D. Holscher; Pary Baluswamy

doi:10.1117/12.388966

5 July 2000 Effect of lens aberrations on pattern placement error

Richard D. Holscher, Pary Baluswamy

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388966
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Projection lens aberrations are typically modeled with Zernike polynomial coefficients. In this paper significant aberration terms that affect pattern placement error are identified using Design of Experiments. Simple models are developed for various 1D and 2D mask structures. These are used to study the impact of different illumination and aberration conditions. The results are used to estimate the impact of projection lens aberrations on overlay error.

Citation Download Citation

Richard D. Holscher and Pary Baluswamy "Effect of lens aberrations on pattern placement error", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388966

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