Experimentation and modeling of organic photocontamination on lithographic optics

Roderick R. Kunz; Vladimir Liberman; Deanna K. Downs

doi:10.1117/12.389036

5 July 2000 Experimentation and modeling of organic photocontamination on lithographic optics

Roderick R. Kunz, Vladimir Liberman, Deanna K. Downs

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389036
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Photodeposition of organic films on transparent substrates irradiated in the presence of trace levels of hydrocarbons has been experimentally investigated and a model is presented that describes the film growth behavior. The efficacy of a given organic precursor at forming a deposit is proportional to the product of its surface coverage and by its photon absorption cross section. These measurement are important in predicting the transmission characteristics of lithographic optics operating at 157-, 193-, and 248-nm wavelength. For example, a lens element irradiated continuously for one year in the presence of 1 part per billion of t-butyl benzene would exhibit a transmission of approximately 87 percent at 193 nm. The effects of oxygen- containing ambients are also documented, and methods for elimination and/or prevention of organic contamination are suggested.

Citation Download Citation

Roderick R. Kunz, Vladimir Liberman, and Deanna K. Downs "Experimentation and modeling of organic photocontamination on lithographic optics", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389036

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